ENI GHW-12Z MKS RF generator GHW-12Z-13DF2NH-001 P/N:0190-49002

Overview

The GHW50 13.56 MHz, 5 kW, RF Plasma Generator offers field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield.

GHW Series RF Plasma Generators are available at 208 VAC and 400/480 VAC.

GHW RF plasma generators are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD),

High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays,

and data storage devices. All MKS Instruments’ RF Generators are NRTL certified and CE marked.

Technical Specs

Type

RF Plasma Generator

Frequency

13.56 MHz ±0.005%

Dynamic Power Range

10 – 1250 W

Power Output

1.25 kW

Load Impedance Range

Unlimited

RF Stability/Spurious Output

Unconditionally stable for any load within operational limits <-45dBc

Harmonic Output & Distortion

<-40dBc

GHW-12Z

Load Mismatch Protection

Automatic, forward power limits typically 0.25ms after reverse power reaches a pre-programmed level = 16% of rated power.

Regulation Tolerance

>125 W: ±1.5% SP, <125 W: ± 3.0 W

Input AC Power

200/208 VAC, 3/PE~ (3W+G) 14 A/PHASE, 380/400 VAC, 3/PE~ (3W+G) 7.5 A/PHASE

RF Connector

Type N

Interface

Standard: RS-232 Subminiature Type-D 9-pin digital, optional custom interface cards available.

Readout

Digital readout displays frequency and forward, reflected and load power.

Rack Mounting

EIA (Standard) 19 inch adapters supplied

Cooling

Water

Cooling System

Water flow at 2.0 Gal./Min. (7.6 LPM) minimum at 5 – 35°C. Connections provided to accept 1/4 inch male (NPT) pipe thread.

Dimensions

Rack Mount: 3.5 x 19 x 20.0 inches (89 x 483 x 508 mm) (height x width x depth)

Weight

32.5 lbs. (14.8 kg)

Compliance

NRTL Listed: UL3111-1 (1994), CAN/CSA C22.2 No. 1010.1-92. EN61010-1:1993. A2:1995. EN50081-2: 1992. EN50082-2: 1995

GHW-12Z