ABB TALYS ADP300 series Dual channel wet process analyzer

TALYS ADP300 series

Dual channel wet process analyzer

Affordable high-performance wet bath monitoring analyzer addressing semiconductor industry needs. This dual channel analysis system, is a state-of-the-art analyzer suited for real-time, batch-type, or single-wafer tool monitoring of wet etching, cleaning, or photoresist (PR) removal processes.

Overview

The TALYS ADP300 series is an evolution of the well known and proven TALYS ASP300 single-channel analysis system, but with improved key performances and two simultaneous measurements.

It provides semiconductor, FPD, and solar-cell manufacturing with superior performance at a cost suitable for today’s tightening budgets.

The dual channel analysis system, is a state-of-the-art analyzer suited for real-time, batch-type, or single-wafer tool monitoring of wet etching, cleaning, or photoresist (PR) removal processes. This low cost, high-performance wet bath monitor allows real-time measurement at process temperature with unique non-contact sampling system design enabling real time dosing and end of bath alerts (no delay time due to sample conditioning).

Features and benefits

Lowest cost of ownership

Minimal footprint

Measures two sampling points simultaneously

One single analyzer suitable for measuring multiple chemistries with on-the fly calibration switching

Unique sampling accessory (ClippIR+) enables non-intrusive measurements and allows system installation without stopping and modifying the tool.

Low maintenance cost: light source to be replaced only every 5 years

Flexibility and performance

This reliable analyzer offers the standard RCA cleaning suite bath prediction configuration. Its flexibility permits bath configuration changes for monitoring chemistry from solar-cell, FPD, and semiconductor manufacturing.

TALYS performance permits equipment operators and engineers to reduce chemical usage and minimize excursion events with real-time bath component predictions.